support trenches

To reline an existing trench, thereby creating a dual containment trench, a secondary liner, having an exterior surface and an interior surface, is placed along the length of the trench to provide secondary containment trench. The second horizontal member may define a first opening passing therethrough and a portion of the bearing surface defining a second opening adapted to receive a bolt passing through the first opening, thereby securing the holding means to the trench wall. And as discussed earlier, the present invention can be used to form gettering sites and getter impurities in any device that includes a semiconductor substrate or wafer having trench regions. The bearing surface defines an opening or groove therein to receive a portion of the horizontal member, with the depending wall overlying the upper portion of the primary liner means. A separating means, having a first surface and an opposed second surface, is placed on the secondary liner means so that the second surface of the separating means is in contact with the interior surface of the secondary liner. In employing another method of securing the holding means, the second wall defines a first opening passing therethrough and a portion of the trench wall defines a second opening adapted to receive a bolt passing through the first opening, thereby securing the holding means to the trench wall. The present invention also is embodied as a method of relining an existing trench, having a bottom and two vertical walls. In this embodiment, each of the frames may include an adjustable anchoring means to position the frame to the proper elevation before pouting concrete or other materials. The present invention can therefore be used without substantially impacting the number of steps used in the fabrication process or the flow of the fabrication process. The frames are suspended from the hangar material using wire or nuts and bolts or other devices to hold the frames at the proper finished elevation. The top surface of the trench wall may have an opening therein to receive a portion of the first depending wall, the second depending wall overlying the upper portion of the primary liner means. The illustrated embodiment depicts an SOI wafer, but other embodiments in accordance with the invention can use any type of substrate layer. The vertical member has an inner surface and an opposite outer surface, the second horizontal member has a lower surface and an opposite upper surface. Gettering sites can also be produced using radiation with elementary particles in an embodiment in accordance with the invention. One advantage of the present invention is that it can use proximity gettering to getter impurities, including slow diffusing impurities. Additionally, trench isolation regions are usually produced at the beginning of, or early in, the fabrication process. The present invention can be used with any type of substrate layer, including substrate layers configured as SOI wafers. The new gettering sites can be produced using the same or different ions from the previously formed gettering sites. In this embodiment, the outer surface of the vertical member and the upper surface of the second horizontal member form a ledge adapted to receive grates and covers. In another alternative preferred embodiment, the holding means comprises a vertical member having an upper end and an opposite lower end, with a first horizontal member extending from the upper end and terminating in a first edge. fiberglass, plastic, stainless steel, coated steel, or any other formable material) that is resistant to the fluids which the trench is designed to hold. In an alternative preferred embodiment, the holding means is substantially U-shaped and comprises a horizontal member having a first end with a first wall depending therefrom and an opposed second end with a second wall depending therefrom. In this embodiment, the top surface of the trench wall has an opening therein to receive a portion of the first depending wall and the second depending wall overlies the upper portion of the primary liner means. In yet another preferred embodiment, the holding means comprises a horizontal member having a first end and a second end and a wall depending from the second end. The secondary liner means may be supported in existing rectangular trenches by placing a support member in a portion of the trench, along its length, to support the secondary liner means. what is trenches what was life like on the western front wwi trench rats bottom of mariana trench service trench red trench coat for men brown jacket trench mariana trench features trenches on the western front jacket mens definition of trenches western front trench trench coat photos trench soldiers wool trench coat men mariana trench images deepest sea trench trenching meaning trench history coat for men jackets mens long coat for men brown trench coat men trench wiki mens white trench coat in the trenches meaning meaning of trenches long coat men double breasted trench coat men

Advertisements

Leave a Reply

Fill in your details below or click an icon to log in:

WordPress.com Logo

You are commenting using your WordPress.com account. Log Out / Change )

Twitter picture

You are commenting using your Twitter account. Log Out / Change )

Facebook photo

You are commenting using your Facebook account. Log Out / Change )

Google+ photo

You are commenting using your Google+ account. Log Out / Change )

Connecting to %s